Post Layout EDA Products
At 90nm and below, the Post Layout EDA tools need to deal with enormous increase in the volume of polygonal data (running into hundreds of GBs), increased complexity of geometrical operations to be carried out and a variety of co-existing Layout and Mask Data formats to support. The traditional Post Layout EDA tools across categories such as Physical Verification, Mask Data Preparation, Design for Manufacturability (DFM) and Yield Management are losing steam due to the above challenges.
SoftJin’s offers new Post Layout EDA tools that have been designed
to meet the above challenges of 90nm node and beyond. Based upon SoftJin’s
long experience in Post Layout EDA Application development and proprietary
geometrical data processing technologies, SoftJin’s Post Layout
Products are targeted at various players in the semiconductor value chain
including back end IC designers, EDA tool developers and Mask data processing
groups in Foundries, Mask Shops and Semiconductor equipment companies.
NxCompare is a fast and versatile comparison tool that can be used to compare any two Layout or Mask databases. NxCompare is distributed processing application based on SoftJin's Nirmaan software development platform and deploys Nirmaan's high performance geometrical operations.
The key benefit of NxCompare is its ability to do real fast geometrical comparison of any two databases, which may be in different formats, have different hierarchies or obtained from two completely different sources. NxCompare has unlimited data handling capacity (can handle hundreds of GBs of GDSII equivalent data) and using distributed computing can compare two databases of any size within couple of hours. As compared to conventional DRC tools, NXCompare provides a better price and performance alternative as it has been specifically designed to deal with comparison of large, cross format databases. More » Back to top NxDAT is software for efficient Analysis, Classification and Trend Analysis of Defects identified by Mask Inspection Systems. The software includes features for easy and fast defect navigation, visual display, defect selection, defect classification, clustering, sophisticated CD analysis, analysis over multiple Inspections, Repeatability and Trend Analysis. These features along with automatic generation of reports, charts, graphs, image mosaics and paretos significantly improve the productivity of the mask inspection operators. The software supports several types of defect analyses including Die-to-Die and Die-to-Database thereby making it applicable at both Mask Shops and Wafer Fabs.
NxDAT’s “open architecture” makes it easily extensible to support multiple Mask Inspection tools from different vendors. A unique Plug-In interface to NxDAT enables Users to add their own proprietary defect analysis and image processing algorithms as well. Based on SoftJin’s Nirmaan Post Layout Software Development Toolkit Platform, NxDAT combines Mask Inspection and Design Automation worlds by supporting correlation of defect data on reticles with Design layout data in any major industry standard Layout and Mask Data formats. More » Back to top Nirmaan is a unique software development toolkit for EDA tool developers for accelerating the development of optimized Post-Layout EDA tools, including DFM/DFY tools. Nirmaan includes efficient and scaleable geometric database (designed to deal with the enormous data volumes at 90 nm and below) and a host of fast geometrical operations commonly required for developing a whole range of Post-Layout EDA tools. Native interfaces are provided to most of the major industry standard Layout and Mask data formats. As a ready-made infrastructure, Nirmaan enables Corporate CAD groups in semiconductor companies and EDA startups to cut-down their Post-Layout Tool development time and effort by 60%. More » Back to top The size of Layout and Mask data is growing continuously with each technology node leading to problems of data transfer, data storage and File I/O for EDA tools. SoftJin has developed patent pending data compression technology specially targeted at IC Layout and Mask Data. Based on the technology, SoftJin is offering reversible (bit-by-bit matching) compression products for GDSII and MEBES format that offer best in class compression of GDSII and MEBES data files along with other value added features such as selective de-compression. More » Back to top SoftJin offers a suite of bi-directional layout and mask data format translators for major industry standards. Some of the translators are direct, one-to-one translators while the other translators go through SoftJin's Nirmaan database as an intermediate format. The direct, one-to-one translators include:
- GDSII to OASIS (available free as part of Anuvad tool suite)
- OASIS to GDSII
- OpenAcess to OASIS
- OASIS to OpenAccess